Concentration Measurement of Silica Polishing Slurry with the BeNano 180 Zeta Max
This application note highlights the effectiveness of the BeNano 180 Zeta Max in measuring silica polishing slurry concentration using the LEDLS technique. LEDLS simplifies sample preparation, enables rapid measurements, and delivers consistent, reliable results. For 130nm silica particles within the optimal concentration range, the measured values closely aligned with theoretical predictions, demonstrating the accuracy and dependability of this method.
Assessing PET Grade Through Molecular Weight Analysis Using the BeSEC
Abstract: Polyethylene terephthalate (PET) grades are primarily defined by molecular weight, which directly influences mechanical performance and processing behavior. In this study, size-exclusion chromatography coupled with static light scattering and refractive index detection was applied to deter...
Determining the Average Zeta Potential and Distribution of Battery Electrode Slurry
This application note presents a study on determining the zeta potential of battery electrode slurry dispersed in NMP solvent. The experiment utilized the BeNano to measure the zeta potential of four different samples. The results showed that all samples had negative zeta potentials, indicating the ...